Semiconductor-equipment supplier Huahai Qingke launched a medium-beam-current ion implanter, adding a new product to its equipment portfolio.

Huahai Qingke introduced the ion implanter at the Bay Area semiconductor exhibition, where domestic suppliers presented new equipment, materials, and tools. The report places the launch within broader efforts by Chinese semiconductor-equipment companies to expand into higher-end products.

The product is specifically identified as a medium-beam-current ion implanter. The supplied report gives no model name, throughput, supported wafer size, process-node qualification, customer acceptance results, or shipment figures.

Other equipment announcements at the same exhibition included two recently launched high-end semiconductor microprocessing tools promoted by AMEC. W lead also introduced its iMagtron magnetron-sputtering physical vapor deposition system and ruthenium ultrathin-film atomic layer deposition equipment, with the report stating that its portfolio now covers atomic layer, chemical vapor, and physical vapor deposition technologies.